Patent law institute 2020 : critical issues & best practices [ebook] /

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Bibliographic Details
Other Authors:	Alter, Scott M. (Contributor), Nemec, Douglas R. (Contributor), White, John M. (Contributor)
Format:	Online
Language:	English
Published:	New York, New York : Practising Law Institute, [2020]
Series:	Intellectual property course handbook series ; no. G-1458
Subjects:	Patent laws and legislation > United States
Online Access:	http://ezp1.villanova.edu/login?url=https://plus.pli.edu/Browse/Title?fq=title_id:(277887)
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