Patent law institute 2020 : critical issues & best practices [ebook] /

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Bibliographic Details
Other Authors: Alter, Scott M. (Contributor), Nemec, Douglas R. (Contributor), White, John M. (Contributor)
Format: Online
Language:English
Published: New York, New York : Practising Law Institute, [2020]
Series:Intellectual property course handbook series ; no. G-1458
Subjects:
Online Access:http://ezp1.villanova.edu/login?url=https://plus.pli.edu/Browse/Title?fq=title_id:(277887)
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003 OCoLC
005 20200623115030.0
006 m o d
008 200604s2020 nyua ob 001 0 eng d
040 |a UtOrBLW  |b eng  |e rda  |c UtOrBLW  |d UtOrBLW 
043 |a n-us--- 
245 0 0 |a Patent law institute 2020 :  |b critical issues & best practices [ebook] /  |c co-chairs, Scott M. Alter, Douglas R. Nemec, John M. White 
246 3 |a Patent law institute 2020 :  |b critical issues and best practices 
264 1 |a New York, New York :  |b Practising Law Institute,  |c [2020] 
300 |a 1 online resource (1,324 pages) :  |b illustrations 
490 1 |a Intellectual property course handbook series ;  |v number G-1458 
500 |a #277887 
500 |a "Prepared for distribution at the patent law institute 2020: critical issues & best practices, New York, April 2-3, 2020; San Francisco, April 23-24, 2020." 
504 |a Includes bibliographical references and index 
650 0 |a Patent laws and legislation  |z United States 
700 1 |a Alter, Scott M.,  |e contributor 
700 1 |a Nemec, Douglas R.,  |e contributor 
700 1 |a White, John M.,  |e contributor 
710 2 |a Practising Law Institute,  |e issuing body 
830 0 |a Intellectual property course handbook series ;  |v no. G-1458 
856 4 0 |u http://ezp1.villanova.edu/login?url=https://plus.pli.edu/Browse/Title?fq=title_id:(277887) 
907 |a .b2441767 
998 |a inter 
999 |c 117810 
852 |a Law Library  |b online